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Ion Pump , 2L-200B , DN150CF , 230L/s Air , ultimate pressure 2.7E-8Pa
Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.
The ion pump works in a closed system which doesn't require continuous working backing pump.
Advantages:
1. Cleanness
2. High vacuum degree
3. Zero noise
4. Zero vibration
5. Convenience in operation.
Applications:
The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to scientific experiment apparatuses such as high-energy particle accelerator, controlled thermonuclear reaction apparatus, electric vacuum device, semiconductor material, electronic microscope and mass spectrometer, and other industrial equipment requiring ultra-high vacuum.
Specifications:
| Model | 2L-200B | ||
| Flange | DN150CF | ||
| Pumping speed(L/S) | ( air) | 230 | |
| Pumping speed | (Ar) | 2.4 | |
| Start-up pressure (Pa) | ≤5×10-4 | ||
| ultimate pressure (Pa) | 2.7×10-8 | ||
| (℃)baking temperature | ＜200 | ||
| With magnetic | |||
| Without magnetic | ＜300 | ||
| working voltage(KV) | 7 | ||
| electrode unit | 4 | ||
| dimension(mm) | 200×140(4-M12) | ||
| L*W*H (mm) | 500×265×430 | ||
| (kg) weight | 100 | ||