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Ion Pump , 3L-100 , DN150CF , 110L/s Air , 24L/s Ar , -5KV , 2.7E-8Pa
Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum. The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump.
Principle:
Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic field and electric field, thus realizing exhausting of gas.
Triode ion pump is improved for increasing the pumping rate for inert gas; ions of inert gas are subjected to grazing incidence into titanium grid of cathode, then neutralized, and reflected to pump wall and anode for being buried with the titanium film. As inert gas buried in the pump wall will not be released due to positive ion bombardment, the pumping speed for inert gas is increased.
Advantages:
This series of pump has advantages such as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation.
Applications:
1. High-energy particle accelerator
2. Controlled thermonuclear reaction apparatus
3. Electric vacuum device
4. Semiconductor material
5. Electronic microscope
6. Mass spectrometer
Specifications:
| Model | 3L-100 | |||
| Flange | DN150CF | |||
| Pumping speed(L/S) | ( air) | 110 | ||
| Pumping speed | (Ar) | 24 | ||
| Start-up pressure (Pa) | ≤5×10-4 | |||
| ultimate pressure (Pa) | 7×10-8 | |||
| (℃)baking temperature | ＜200 | |||
| With magnetic | ||||
| Without magnetic | ＜300 | |||
| working voltage(KV) | -5 | |||
| electrode unit | 4 | |||
| dimension(mm) | 140×210(4-M10) | |||
| L*W*H (mm) | 350×250×307 | |||
| (kg) weight | 38 | |||