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Ion Pump , 2L-100 , DN150CF , 120L/s Air , 1.2L/s Ar , +7KV
Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum, with such advantages as cleanness, high vacuum degree, zero noise, zero vibration and convenience in operation. The ion pump works in a closed system which doesn't require continuous working backing pump.
Principle:
Material of anode is stainless steel barrel, and material of cathode istitanium plate. Penning discharge process ionizes gas under the joint action of magnetic field and electric field, thus realizing exhausting of gas.
Applications:
The sputter-ion pump is main pump of oil less ultra-high vacuum set, and it can be applied to scientific experiment apparatuses such as high-energy particle accelerator, controlled thermonuclear reaction apparatus, electric vacuum device, semiconductor material, electronic microscope and mass spectrometer, and other industrial equipment requiring ultra-high vacuum.
Specifications:
Model | 2L-100 | ||
Flange | DN150CF | ||
Pumping speed(L/S) | ( air) | 120 | |
Pumping speed | (Ar) | 1.2 | |
Start-up pressure (Pa) | ≤5×10-4 | ||
ultimate pressure (Pa) | 7×10-8 | ||
(℃)baking temperature | <200 | ||
With magnetic | |||
Without magnetic | <300 | ||
working voltage(KV) | 7 | ||
electrode unit | 4 | ||
dimension(mm) | 140×210(4-M10) | ||
L*W*H (mm) | 350×250×307 | ||
(kg) weight | 38 |